@article{oai:doshisha.repo.nii.ac.jp:00021097,
 author = {ヴァスケズ, マグダレノ, ジュニア and Vasquez, Magdaleno R., Jr. and 粕谷, 俊郎 and Kasuya, Toshiro and 木村, 恭之 and Kimura, Yasuyuki and 前野, 修一 and Maeno, Shuichi and 剣持, 貴弘 and Kenmotsu, Takahiro and 和田, 元 and Wada, Motoi},
 issue = {2},
 journal = {同志社大学理工学研究報告, The Science and Engineering Review of Doshisha University},
 month = {Jul},
 note = {可能な限り不純物の混入を抑えるため,ガラス容器とRF電源により構成される,液体金属スパッター装置を設計・製作した.球形ガラス容器底部には,ターゲット近傍に放電を集中させ,電離を促進するために円筒,及びトロイダル形状の磁石を配置し得る電極が取り付けられる.誘導性プラズマ結合系は,RF電力の気体放電に対する良い結合性を示し,低圧力大RF電力で安定にプラズマを維持する.ガラス容器底部に保持した液体ガリウムが周辺プラズマによりスパッターされていることは,四重極質量分析器により確認された.電子温度の評価は局所熱平衡条件をもとに,線スペクトル発光分析より評価した., A liquid metal sputtering system equipped with a SiO[2] reservoir and a radio frequency (RF) power supply has been designed and built to minimize possible contamination due to sputtering from any materials other than the target material. An electrode fitted with cylindrical and toroidal magnets was designed and mounted at the bottom of the spherical glass chamber in order to confine the discharge near the target and enhance the ionization efficiency. The inductively coupled plasma configuration exhibited good coupling of the RF power to the gas discharge sustained at low gas pressures and high RF powers. Liquid gallium suspended upon the chamber bottom was confirmed sputtered by the surrounding plasma by a quadrupole mass analyzer. Electron temperature (T[e]) was estimated from the optical emission lines under the local thermodynamic equilibrium (LTE) approximation., 抄録に表記の[2]と[e]は下つき文字, application/pdf},
 pages = {1--10},
 title = {Sputtering of liquid metal suspended on an insulating reservoir by radio frequency self-bias},
 volume = {51},
 year = {2010},
 yomi = {カスヤ, トシロウ and キムラ, ヤスユキ and マエノ, シュウイチ and ケンモツ, タカヒロ and ワダ, モトイ}
}