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The electrode demonstrated excellent stability against high-voltage break down and was able to sustain Ar discharge in the pressure range from 10 to 100 Pa. The steady state production of metallic particle flux is expected with enough cathode voltage to ensure a necessary sputtering yield. The source can generate the sputtered atom flux of the order of one monolayer per second and can serve as the Ti source for TiO2 atomic layer film preparation.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_1_description_13":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"This work was supported in part by grants-in-aid for division research from the Harris Science Research Institute of Doshisha 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