{"created":"2023-10-16T01:01:50.815362+00:00","id":2000098,"links":{},"metadata":{"_buckets":{"deposit":"1ac3e571-4087-4658-a247-f0a959214f41"},"_deposit":{"created_by":20,"id":"2000098","owner":"20","owners":[20],"pid":{"revision_id":0,"type":"depid","value":"2000098"},"status":"published"},"_oai":{"id":"oai:doshisha.repo.nii.ac.jp:02000098","sets":["4151:8699:4187:4188","4251:7205:7206:8773:7207"]},"author_link":["31069"],"control_number":"2000098","item_1693813220986":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_1694497428290":{"attribute_name":"学位名","attribute_value_mlt":[{"subitem_degreename":"博士(工学)","subitem_degreename_language":"ja"}]},"item_1694497507610":{"attribute_name":"学位名（英）","attribute_value_mlt":[{"subitem_degreename":"Doctor of Philosophy in Engineering","subitem_degreename_language":"en"}]},"item_1694497573527":{"attribute_name":"学位授与機関","attribute_value_mlt":[{"subitem_degreegrantor":[{"subitem_degreegrantor_language":"ja","subitem_degreegrantor_name":"同志社大学"},{"subitem_degreegrantor_language":"en","subitem_degreegrantor_name":"Doshisha University"}],"subitem_degreegrantor_identifier":[{"subitem_degreegrantor_identifier_name":"34310","subitem_degreegrantor_identifier_scheme":"kakenhi"}]}]},"item_3_alternative_title_2":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"反応性マグネトロンスパッタリングプラズマ中の水蒸気 : 特徴と応用","subitem_alternative_title_language":"ja"},{"subitem_alternative_title":"ハンノウセイ マグネトロン スパッタリング プラズマチュウ ノ スイジョウキ : トクチョウ ト オウヨウ","subitem_alternative_title_language":"ja-Kana"}]},"item_3_date_granted_27":{"attribute_name":"学位授与年月日","attribute_value_mlt":[{"subitem_dategranted":"2023-09-20"}]},"item_3_description_12":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"DC反応性マグネトロンスパッタリングにおける水蒸気プラズマを用いた酸化亜鉛薄膜の成膜について、薄膜成膜とプラズマソースでの検討を行いました。DCマグネトロンスパッタリングプラズマの特性は、ターゲット表面、基板蒸着領域、バルクプラズマの3つの重要な領域で詳細に調査しました。プラズマソースからの制御された輸送は、パルス化されたコンジットタイプの取り出し電極まで拡張しました。プラズマにさらされた表面への水の吸着とプラズマ中の負イオンの存在は、局所的なプラズマパラメータに大きな影響を与えました。","subitem_description_language":"ja","subitem_description_type":"Abstract"},{"subitem_description":"The deposition of zinc oxide thin films using water vapor plasma as the reactive gas in DC reactive magnetron sputtering was explored for thin film deposition and in a plasma source. The characteristics of the DC magnetron sputtering plasma was investigated at three key areas: at the target surface, the substrate deposition area, and the bulk plasma. Controlled transport from the plasma source was extended to a pulsed, conduit-type extraction electrode. The adsorption of water onto the surfaces exposed to plasma and the presence of negative ions in the plasma significantly affected the local plasma parameters.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_3_description_18":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_3_dissertation_number_28":{"attribute_name":"学位授与番号","attribute_value_mlt":[{"subitem_dissertationnumber":"甲第1311号"}]},"item_3_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.14988/0002000098","subitem_identifier_reg_type":"JaLC"}]},"item_3_text_8":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_language":"ja","subitem_text_value":"理工学研究科"}]},"item_3_text_9":{"attribute_name":"著者所属（英）","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"Graduate School of Science and Engineering"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorAlternatives":[{"creatorAlternative":"カタパング, アレン ビンセント バラボナ","creatorAlternativeLang":"ja"}],"creatorNames":[{"creatorName":"Catapang, Allen Vincent Barabona","creatorNameLang":"en"}],"familyNames":[{"familyName":"Catapang","familyNameLang":"en"}],"givenNames":[{"givenName":"Allen Vincent Barabona","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"31069","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"0000-0002-5317-1562","nameIdentifierScheme":"ORCID","nameIdentifierURI":"https://orcid.org/0000-0002-5317-1562"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-10-18"}],"displaytype":"detail","filename":"k1311.pdf","filesize":[{"value":"306KB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"要旨/abstaract","objectType":"abstract","url":"https://doshisha.repo.nii.ac.jp/record/2000098/files/k1311.pdf"},"version_id":"8d5c94a7-88d3-4084-b8df-8e8f1b0e5e3b"},{"accessrole":"open_access","date":[{"dateType":"Available","dateValue":"2024-07-24"}],"displaytype":"detail","filename":"zk1311.pdf","filesize":[{"value":"24.2 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://doshisha.repo.nii.ac.jp/record/2000098/files/zk1311.pdf"},"version_id":"5faf4ae5-f7ea-46df-9eff-9939c85c2930"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"reactive magnetron sputtering","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"plasma-material science","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"plasma diagnostics","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"},{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"doctoral thesis","resourceuri":"http://purl.org/coar/resource_type/c_db06"}]},"item_title":"Water vapor in DC reactive magnetron sputtering plasma : characteristics and applications","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Water vapor in DC reactive magnetron sputtering plasma : characteristics and applications","subitem_title_language":"en"}]},"item_type_id":"3","owner":"20","path":["4188","7207"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2023-10-18"},"publish_date":"2023-10-18","publish_status":"0","recid":"2000098","relation_version_is_last":true,"title":["Water vapor in DC reactive magnetron sputtering plasma : characteristics and applications"],"weko_creator_id":"20","weko_shared_id":-1},"updated":"2024-07-24T07:16:50.220465+00:00"}