{"created":"2023-07-27T07:45:40.910644+00:00","id":19931,"links":{},"metadata":{"_buckets":{"deposit":"1739ee06-b9e9-4b9a-8dde-0d3323b188b3"},"_deposit":{"created_by":20,"id":"19931","owners":[20],"pid":{"revision_id":0,"type":"depid","value":"19931"},"status":"published"},"_oai":{"id":"oai:doshisha.repo.nii.ac.jp:00019931","sets":["4251:8393:8394:8395:8426","8:3372:3812:3843"]},"author_link":["169","15406","15407","15408","15409","4","15410"],"item_1693811493084":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_1694490770713":{"attribute_name":"権利者情報","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"DA03974933","nameIdentifierScheme":"AID"}],"rightHolderNames":[{"rightHolderLanguage":"ja","rightHolderName":"同志社大学理工学研究所"},{"rightHolderLanguage":"en","rightHolderName":"Science and Engineering Research Institute of Doshisha University"}]}]},"item_1_biblio_info_14":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2007-07-31","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageEnd":"85","bibliographicPageStart":"[78]","bibliographicVolumeNumber":"48","bibliographic_titles":[{"bibliographic_title":"同志社大学理工学研究報告","bibliographic_titleLang":"ja"},{"bibliographic_title":"The Science and Engineering Review of Doshisha University","bibliographic_titleLang":"en"}]}]},"item_1_description_12":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"筆者らは配管ラインおよび気化器における成膜原料の熱分解などの諸問題を解決するため、減圧沸騰噴霧を用いた新しい化学気相堆積法(CVD)であるフラッシングスプレーCVD(FS-CVD)法を提案している。本手法は液体の成膜原料をチャンバ内の低雰囲気圧場に非定常間欠噴霧によりCVDチャンバ直上に設けたインジェクタより直接供給する。さらに揮発溶剤を混合することにより気液平衡理論により低揮発性の成膜原料を高揮発性物性値に改善することが可能である。本実験ではTEOSとn-ペンタン混合溶液を使用した.本実験に最適なノズル形状を拡大撮影画像とLIFとMie散乱画像から得られる蒸気濃度分布、気化特性、液相ペネトレーションより評価した。最適化したノズルを用いてFS-CVD法により成膜を行った。","subitem_description_language":"ja","subitem_description_type":"Abstract"},{"subitem_description":"The authors proposed the novel chemical vapor deposition (CVD) by using flash boiling spray. In the present study the flashing spray CVD (FS-CVD) is expected to improve several kind of problems such as decomposition of the precursor at vaporizer and supply line. With the proposed method, the liquid precursors are supplied directly through an injector, which is installed at the CVD chamber as an unsteady and intermittent spray into lower ambient chamber. Furthermore, low volatile precursors can be converted into higher volatile properties by mixing the volatile solution at the vapor-liquid equilibrium. In the experiment, TEOS and n-pentane mixed solution were used. The best nozzle shape was estimated from magnification photography image, vapor distribution, evaporation characteristics, and liquid penetration. All of which were taken by the image of LIF and Mie scattering, where the film is formed by FS-CVD with optimized nozzle.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_1_description_25":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_1_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.14988/pa.2017.0000011136","subitem_identifier_reg_type":"JaLC"}]},"item_1_publisher_15":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"同志社大学理工学研究所","subitem_publisher_language":"ja"}]},"item_1_publisher_16":{"attribute_name":"出版者（英）","attribute_value_mlt":[{"subitem_publisher":"Science and Engineering Research Institute of Doshisha 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School of Engineering, Doshisha University, Kyoto"},{"subitem_text_language":"ja","subitem_text_value":"富永, 浩二 / HORIBA, Ltd, Kyoto"},{"subitem_text_language":"ja","subitem_text_value":"中尾, 基 / Kyushu Institute of Technology"},{"subitem_text_language":"ja","subitem_text_value":"清水, 哲夫 / HORIBA STEC Inc, Kyoto"},{"subitem_text_language":"ja","subitem_text_value":"千田, 二郎 / 同志社大学工学部機械システム工学科教授"},{"subitem_text_language":"ja","subitem_text_value":"石田, 耕三 / HORIBA, Ltd, Kyoto"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"大嶋, 元啓","creatorNameLang":"ja"},{"creatorName":"オオシマ, モトヒロ","creatorNameLang":"ja-Kana"},{"creatorName":"Oshima, Motohiro","creatorNameLang":"en"}],"nameIdentifiers":[{},{},{}]},{"creatorNames":[{"creatorName":"米田, 有紀子","creatorNameLang":"ja"},{"creatorName":"コメダ, アキコ","creatorNameLang":"ja-Kana"},{"creatorName":"Komeda, Akiko","creatorNameLang":"en"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"富永, 浩二","creatorNameLang":"ja"},{"creatorName":"トミナガ, コウジ","creatorNameLang":"ja-Kana"},{"creatorName":"Tominaga, Koji","creatorNameLang":"en"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"中尾, 基","creatorNameLang":"ja"},{"creatorName":"ナカオ, モトイ","creatorNameLang":"ja-Kana"},{"creatorName":"Nakao, Motoi","creatorNameLang":"en"}],"nameIdentifiers":[{},{},{}]},{"creatorNames":[{"creatorName":"清水, 哲夫","creatorNameLang":"ja"},{"creatorName":"シミズ, テツオ","creatorNameLang":"ja-Kana"},{"creatorName":"Shimizu, Tetsuo","creatorNameLang":"en"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"千田, 二郎","creatorNameLang":"ja"},{"creatorName":"センダ, ジロウ","creatorNameLang":"ja-Kana"},{"creatorName":"Senda, Jiro","creatorNameLang":"en"}],"nameIdentifiers":[{},{},{}]},{"creatorNames":[{"creatorName":"石田, 耕三","creatorNameLang":"ja"},{"creatorName":"イシダ, コウゾウ","creatorNameLang":"ja-Kana"},{"creatorName":"Ishida, Kozo","creatorNameLang":"en"}],"nameIdentifiers":[{},{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2008-04-15"}],"displaytype":"detail","filename":"023048020003.pdf","filesize":[{"value":"1.7 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"023048020003.pdf","url":"https://doshisha.repo.nii.ac.jp/record/19931/files/023048020003.pdf"},"version_id":"20e3f131-5d96-4cea-a7d8-51348b6ce3a8"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"減圧沸騰","subitem_subject_language":"ja","subitem_subject_scheme":"Other"},{"subitem_subject":"噴霧","subitem_subject_language":"ja","subitem_subject_scheme":"Other"},{"subitem_subject":"ニ相領域","subitem_subject_language":"ja","subitem_subject_scheme":"Other"},{"subitem_subject":"CVD","subitem_subject_language":"ja","subitem_subject_scheme":"Other"},{"subitem_subject":"インジェクタ","subitem_subject_language":"ja","subitem_subject_scheme":"Other"},{"subitem_subject":"Mie 散乱","subitem_subject_language":"ja","subitem_subject_scheme":"Other"},{"subitem_subject":"flash boiling","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"spray","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"two phase region","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"chemical vapor deposition","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"injector","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Mie scattering","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"LIF","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin 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